XIONG, Siyu. Research on Measurement Methods for Silicon Carbide Epitaxial Layer Thickness Based on Optical Interference Principles. Highlights in Science, Engineering and Technology, [S. l.], v. 159, p. 510–520, 2025. DOI: 10.54097/34es0v64. Disponível em: https://drphset.com/index.php/ojs/article/view/67. Acesso em: 14 nov. 2026.